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Performance enhancements in scaled strained-SiGe pMOSFETs with HfSiOx/TiSiN gate stacks
Alatise, Olayiwola M..  IEEE Transactions on Electron Devices.  v. Vol.56. no. No.10.   2009. p. 2277 - 2284... issn: 0018-9383 .   

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