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AN INVESTIGATION OF THE DIFFUSION OF SILICON IN DELTA-DOPED GALLIUM-ARSENIDE, AS DETERMINED USING HIGH-RESOLUTION SECONDARY ION MASS-SPECTROMETRY
JOURNAL OF APPLIED PHYSICS.
v.
70.
no.
2.
1991-07-15.
p.
821 -
826...
issn:
0021-8979
.
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