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Use of two beam energies in secondary ion mass spectrometry analysis of shallow implants: Resolution-matched profiling
5th International Workshop on Measurement, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors (USJ 99).
v.
18.
no.
1.
2000-01.
p.
493 -
495...
issn:
1071-1023
.
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