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Experimental investigation of the increase in depth resolution obtained through the use of maximum entropy deconvolution of secondary ion mass spectrometry depth profiles
3rd International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors.
v.
14.
no.
1.
1996-01.
p.
283 -
286...
issn:
1071-1023
.
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