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COMPARISON BETWEEN COMPUTER-SIMULATION AND DIRECT SECONDARY-ION MASS-SPECTROMETRY MEASUREMENT OF LATERAL DOPANT DISTRIBUTIONS
2nd International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors.  v. 12. no. 1.   1994-01. p. 243 - 246... issn: 1071-1023 .   

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